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Raman Micro-Spectroscopy
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Raman spectroscopy
is a non-destructive technique based on inelastic light scattering.
It can be used to characterize materials, thin films and structures.
Typical applications:
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| Raman
spectra of the 2 phases of titanium silicide. |
- Identification
of chemical species and bonding interactions; depth profiling
- Crystallinity:
distinguishing crystalline, polycrystalline and amorphous phases
- Crystal orientation
detection, ion damage
- Lattice strain
measurement, i.e. in epitaxial layers, or silicon on insulator
- Dopant or impurity
identification and concentration
- Microcontamination
analysis
- Surface modifications
and reactions studies i.e. oxidation, silicidation, etching and
implant damage
- Chemical analysis:
silicides, superconductors, particulates
Equipment:
ISA MOLE 3000 Raman
microprobe with a 5 W Ar+ laser
Technical Description:
Raman spectroscopy
characterises materials by measuring frequency shifts in inelastic
light scattering. It is used to acquire the frequency spectrum of
vibrational excitations (phonons) and electronic excitations in
solid, liquid or gaseous samples. In the solid state it is applicable
to samples in bulk form, thin films, and microscopic structures
(e.g. device structures or particulates).
This technique
is non-contacting and non-destructive (~50mW at the sample) and
enables analysis through transparent layers. The MuAnalysis system
has 0.2 wavenumber spectral resolution, with 1µm spatial resolution,
but identification of sub-micrometer size particles is feasible.
For identification of unknowns, MuAnalysis maintains an extensive
on-line custom library of Raman spectra.
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